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Process for making improved shallow trench isolation by employing nitride spacers in the formation of the trenches

US 6,232,203 B1 · Assignee: Taiwan Semiconductor Manufacturing Company · Inventors: Huang; Kuei-Wu

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Listed from its USPTO record in Patent Yard's full-term archive. Its claims, description and drawings are in the USPTO PDF and on Google Patents, and the Claude kit works from them.

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Why it's free to use

  • Filed July 23, 1999. A US utility patent lasts 20 years from filing, so its term ended July 23, 2019.
  • Patents filed before May 29, 2000 can't get a term adjustment for USPTO delays, and any other extension is capped at five years, so it can't still be in force.
  • We haven't checked its US family, and a later related patent could still be in force. We check US rights only.
FiledJuly 23, 1999
GrantedMay 15, 2001
Term endedJuly 23, 2019
Application number09/360119
Classification (CPC)H10W10/0145 +1 more
Length10 pages

Timeline

Timeline From USPTO dates

2000200220042006200820102012201420162018Application filedJuly 23, 1999Patent grantedMay 15, 2001Term endedJuly 23, 2019

Sources & verification

Official USPTO records

Full published documentText and every drawing sheet as a PDF.USPTOFile historyStatus, office actions, notices, fee records and petitions.USPTO Patent CenterPatent Public Search recordSearchable full text and bibliographic data.USPTO

Cross-check elsewhere

Google PatentsFull text, worldwide family, citing patents and legal events.patents.google.comJustia PatentsFull text, claims and classification.patents.justia.comFreePatentsOnlineFull text and PDF.freepatentsonline.comEspacenetForeign family and legal status.European Patent Office

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