Process for uniform deposition of tungsten silicide on semiconductor wafers by treatment of susceptor having aluminum nitride surface thereon with tungsten silicide after cleaning of susceptor

US 5,510,297 A · Assignee: Applied Materials, Inc. · Inventors: Telford; Susan et al.

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Filed August 10, 1995. A US utility patent lasts 20 years from filing, so its term ended August 10, 2015.
Patents filed before May 29, 2000 can't get a term adjustment for USPTO delays, and any other extension is capped at five years, so it can't still be in force.
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FiledAugust 10, 1995

GrantedApril 23, 1996

Term endedAugust 10, 2015

Application number08/504294

Classification (CPC)C23C16/42 +2 more

Length5 pages

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Full published documentText and every drawing sheet as a PDF.USPTO File historyStatus, office actions, notices, fee records and petitions.USPTO Patent Center Patent Public Search recordSearchable full text and bibliographic data.USPTO

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