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Method of producing semiconductor devices by selective laser irradiation and oxidation

US 4,292,091 A · Assignee: VLSI Technology Research Association · Inventors: Togei; Ryoiku

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Listed from its USPTO record in Patent Yard's full-term archive. Its claims, description and drawings are in the USPTO PDF and on Google Patents, and the Claude kit works from them.

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Why it's free to use

  • Filed February 25, 1980 and granted September 29, 1981. A patent filed before June 8, 1995 lasts 17 years from grant or 20 from filing, whichever is longer, so its term ended February 25, 2000.
  • Any extension is capped at five years, so it can't still be in force.
  • We haven't checked its US family, and a later related patent could still be in force. We check US rights only.
FiledFebruary 25, 1980
GrantedSeptember 29, 1981
Term endedFebruary 25, 2000
Application number06/124467
Classification (CPC)H10P14/2905 +2 more
Length8 pages

Timeline

Timeline From USPTO dates

1981198319851987198919911993199519971999Application filedFeb 25, 1980Patent grantedSep 29, 1981Term endedFeb 25, 2000

Sources & verification

Official USPTO records

Full published documentText and every drawing sheet as a PDF.USPTOFile historyStatus, office actions, notices, fee records and petitions.USPTO Patent CenterPatent Public Search recordSearchable full text and bibliographic data.USPTO

Cross-check elsewhere

Google PatentsFull text, worldwide family, citing patents and legal events.patents.google.comJustia PatentsFull text, claims and classification.patents.justia.comFreePatentsOnlineFull text and PDF.freepatentsonline.comEspacenetForeign family and legal status.European Patent Office

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