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Plasma processing apparatus and plasma processing method

US 2010/0291319 A1 · Assignee: TOKYO ELECTRON LIMITED · Inventors: Yamashita; Jun et al.

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Listed from its USPTO record in Patent Yard's full-term archive. Its claims, description and drawings are in the USPTO PDF and on Google Patents, and the Claude kit works from them.

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Why it's free to use

  • Published November 18, 2010, and no patent has issued anywhere in its US family since.
  • Nothing has been filed in its family for more than seven years, so it is very unlikely to still be pending.
  • This status is inferred from USPTO records. Confirm it on Patent Center before relying on it.
FiledSeptember 29, 2008
PublishedNovember 18, 2010
StatusAbandoned (inferred)
Application number12/680645
Classification (CPC)H01J37/32495 +1 more
Length21 pages

Timeline

Timeline From USPTO dates

20092010Application filedSep 29, 2008Application publishedNov 18, 2010

Sources & verification

Official USPTO records

Full published documentText and every drawing sheet as a PDF.USPTOFile historyStatus, office actions, notices, fee records and petitions.USPTO Patent CenterPatent Public Search recordSearchable full text and bibliographic data.USPTO

Cross-check elsewhere

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