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Method for manufacturing co-base sintered alloy sputtering target for formation of magnetic recording film which is less likely to generate partricles, and co-base sintered alloy sputtering target for formation of magnetic recording film

US 2010/0270146 A1 · Assignee: MITSUBISHI MATERIALS CORPORATION · Inventors: Nonaka; Sohei et al.

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Listed from its USPTO record in Patent Yard's full-term archive. Its claims, description and drawings are in the USPTO PDF and on Google Patents, and the Claude kit works from them.

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Why it's free to use

  • Published October 28, 2010, and no patent has issued anywhere in its US family since.
  • Nothing has been filed in its family for more than seven years, so it is very unlikely to still be pending.
  • This status is inferred from USPTO records. Confirm it on Patent Center before relying on it.
FiledMarch 30, 2007
PublishedOctober 28, 2010
StatusAbandoned (inferred)
Application number12/294691
Classification (CPC)C23C14/3414 +2 more
Length28 pages

Timeline

Timeline From USPTO dates

200820092010Application filedMarch 30, 2007Application publishedOct 28, 2010

Sources & verification

Official USPTO records

Full published documentText and every drawing sheet as a PDF.USPTOFile historyStatus, office actions, notices, fee records and petitions.USPTO Patent CenterPatent Public Search recordSearchable full text and bibliographic data.USPTO

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