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Plasma processing apparatus and control method for plasma processing apparatus

US 2009/0283502 A1 · Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION · Inventors: OBAMA; Shinji et al.

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Listed from its USPTO record in Patent Yard's full-term archive. Its claims, description and drawings are in the USPTO PDF and on Google Patents, and the Claude kit works from them.

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Why it's free to use

  • Published November 19, 2009, and no patent has issued anywhere in its US family since.
  • Nothing has been filed in its family for more than seven years, so it is very unlikely to still be pending.
  • This status is inferred from USPTO records. Confirm it on Patent Center before relying on it.
FiledAugust 13, 2008
PublishedNovember 19, 2009
StatusAbandoned (inferred)
Application number12/191016
Classification (CPC)H01J37/32091 +2 more
Length11 pages

Timeline

Timeline From USPTO dates

2009Application filedAug 13, 2008Application publishedNov 19, 2009

Sources & verification

Official USPTO records

Full published documentText and every drawing sheet as a PDF.USPTOFile historyStatus, office actions, notices, fee records and petitions.USPTO Patent CenterPatent Public Search recordSearchable full text and bibliographic data.USPTO

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