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Method for forming self-aligned dual fully silicided gates in cmos devices

EP 1831925 A2 · Applicant: International Business Machines Corporation

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Listed from its EPO record in Patent Yard's archive of European patents past their term. Its claims, description and drawings are in the EPO PDF and on Google Patents, and the Claude kit works from them.

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Why it's free to use

  • Filed December 1, 2005 and never granted as a European patent. Had it been granted, its 20-year term would have ended December 1, 2025.
  • Supplementary protection certificates extend only medicine and crop-protection patents, and it isn't classified as either.
  • We check European rights only. A US or other national patent in its family could still be in force: check its family on Espacenet or Google Patents.
FiledDecember 1, 2005
PublishedSeptember 12, 2007
GrantedNever granted
Term endedDecember 1, 2025
Application numberEP 05852637
Classification (CPC)H10D84/0174 +1 more

Timeline

Timeline From EPO dates

2006200820102012201420162018202020222024Application filedDec 1, 2005PublishedSep 12, 2007Term endedDec 1, 2025

Sources & verification

Official EPO records

Full published documentClaims, description and drawings as a PDF.EPOEuropean Patent RegisterProcedure, status, file inspection and legal events.EPOLinked open EP data recordThe bibliographic record this page is built from.EPO

Cross-check elsewhere

Google PatentsFull text, worldwide family, citing patents and legal events.patents.google.comEspacenetNational family members and their legal status.European Patent Office

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