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A method and apparatus for forming a high quality low temperature silicon nitride film

EP 1608792 A2 · Applicant: APPLIED MATERIALS, INC.

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Listed from its EPO record in Patent Yard's archive of European patents past their term. Its claims, description and drawings are in the EPO PDF and on Google Patents, and the Claude kit works from them.

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Why it's free to use

  • Filed December 18, 2003 and never granted as a European patent. Had it been granted, its 20-year term would have ended December 18, 2023.
  • Supplementary protection certificates extend only medicine and crop-protection patents, and it isn't classified as either.
  • We check European rights only. A US or other national patent in its family could still be in force: check its family on Espacenet or Google Patents.
FiledDecember 18, 2003
PublishedDecember 28, 2005
GrantedNever granted
Term endedDecember 18, 2023
Application numberEP 03814209
Classification (CPC)C23C16/56 +2 more

Timeline

Timeline From EPO dates

2004200620082010201220142016201820202022Application filedDec 18, 2003PublishedDec 28, 2005Term endedDec 18, 2023

Sources & verification

Official EPO records

Full published documentClaims, description and drawings as a PDF.EPOEuropean Patent RegisterProcedure, status, file inspection and legal events.EPOLinked open EP data recordThe bibliographic record this page is built from.EPO

Cross-check elsewhere

Google PatentsFull text, worldwide family, citing patents and legal events.patents.google.comEspacenetNational family members and their legal status.European Patent Office

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