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A method of patterning photoresist on a wafer using a reflective mask with a multi-layer arc

EP 1602007 A2 · Applicant: Freescale Semiconductor, Inc.

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Listed from its EPO record in Patent Yard's archive of European patents past their term. Its claims, description and drawings are in the EPO PDF and on Google Patents, and the Claude kit works from them.

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Why it's free to use

  • Filed February 13, 2004 and never granted as a European patent. Had it been granted, its 20-year term would have ended February 13, 2024.
  • Supplementary protection certificates extend only medicine and crop-protection patents, and it isn't classified as either.
  • We check European rights only. A US or other national patent in its family could still be in force: check its family on Espacenet or Google Patents.
FiledFebruary 13, 2004
PublishedDecember 7, 2005
GrantedNever granted
Term endedFebruary 13, 2024
Application numberEP 04711211
Classification (CPC)G03F1/54 +2 more

Timeline

Timeline From EPO dates

2005200720092011201320152017201920212023Application filedFeb 13, 2004PublishedDec 7, 2005Term endedFeb 13, 2024

Sources & verification

Official EPO records

Full published documentClaims, description and drawings as a PDF.EPOEuropean Patent RegisterProcedure, status, file inspection and legal events.EPOLinked open EP data recordThe bibliographic record this page is built from.EPO

Cross-check elsewhere

Google PatentsFull text, worldwide family, citing patents and legal events.patents.google.comEspacenetNational family members and their legal status.European Patent Office

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