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Techniques for forming trenches in a silicon layer of a substrate in a high density plasma processing system

EP 1070342 B1 · Applicant: LAM RESEARCH CORPORATION

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Listed from its EPO record in Patent Yard's archive of European patents past their term. Its claims, description and drawings are in the EPO PDF and on Google Patents, and the Claude kit works from them.

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Why it's free to use

  • Filed March 30, 1999 and granted March 12, 2008. A European patent lasts at most 20 years from filing, so its term ended March 30, 2019.
  • A supplementary protection certificate, which can extend a medicine or crop-protection patent, adds at most five and a half years, so even that would have ended by September 30, 2024.
  • We check European rights only. A US or other national patent in its family could still be in force: check its family on Espacenet or Google Patents.
FiledMarch 30, 1999
PublishedJanuary 24, 2001
GrantedMarch 12, 2008
Term endedMarch 30, 2019
Application numberEP 99916217
Classification (CPC)H01J37/321 +2 more

Timeline

Timeline From EPO dates

2000200220042006200820102012201420162018Application filedMarch 30, 1999PublishedJan 24, 2001Patent grantedMarch 12, 2008Term endedMarch 30, 2019

Sources & verification

Official EPO records

Full published documentClaims, description and drawings as a PDF.EPOEuropean Patent RegisterProcedure, status, file inspection and legal events.EPOLinked open EP data recordThe bibliographic record this page is built from.EPO

Cross-check elsewhere

Google PatentsFull text, worldwide family, citing patents and legal events.patents.google.comEspacenetNational family members and their legal status.European Patent Office

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