European application, no grantEurope
Method and apparatus for cleaning semiconductor wafers with a deionized water solution containing a gas at saturated concentration, with temperature controlled degasification and megasonic agitation
EP 1056121 A2 · Applicant: International Business Machines Corporation
Overview
The published document from the EPO: abstract, claims, description and drawings. Open it full size
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Listed from its EPO record in Patent Yard's archive of European patents past their term. Its claims, description and drawings are in the EPO PDF and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed April 10, 2000 and never granted as a European patent. Had it been granted, its 20-year term would have ended April 10, 2020.
- A supplementary protection certificate, which can extend a medicine or crop-protection patent, adds at most five and a half years, so even that would have ended by October 10, 2025.
- We check European rights only. A US or other national patent in its family could still be in force: check its family on Espacenet or Google Patents.
FiledApril 10, 2000
PublishedNovember 29, 2000
GrantedNever granted
Term endedApril 10, 2020
Application numberEP 00107681
Classification (CPC)B08B3/12 +1 more
Timeline
Timeline From EPO dates
Sources & verification
Official EPO records
Everything on this page comes from the EPO record linked above. EPO data used under CC BY 4.0.