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Expired European patentEurope

Double layer photoresist process for well self-align and ion implantation masking

EP 0256030 B1 · Applicant: Hughes Aircraft Company

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Overview

The published document from the EPO: abstract, claims, description and drawings. Open it full size

Read the whole patent

Listed from its EPO record in Patent Yard's archive of European patents past their term. Its claims, description and drawings are in the EPO PDF and on Google Patents, and the Claude kit works from them.

Why it's free to use

  • Filed November 24, 1986 and granted October 24, 1990. A European patent lasts at most 20 years from filing, so its term ended November 24, 2006.
  • A supplementary protection certificate, which can extend a medicine or crop-protection patent, adds at most five and a half years, so even that would have ended by May 24, 2012.
  • We check European rights only. A US or other national patent in its family could still be in force: check its family on Espacenet or Google Patents.
FiledNovember 24, 1986
PublishedFebruary 24, 1988
GrantedOctober 24, 1990
Term endedNovember 24, 2006
Application numberEP 87900395
Classification (CPC)H10D84/038 +2 more

Timeline

Timeline From EPO dates

1987198919911993199519971999200120032005Application filedNov 24, 1986PublishedFeb 24, 1988Patent grantedOct 24, 1990Term endedNov 24, 2006

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