European application, no grantEurope
Method of fabricating semiconductor device having low resistance non-alloyed contact layer
EP 0226106 A2 · Applicant: ALLIED CORPORATION
Overview
The published document from the EPO: abstract, claims, description and drawings. Open it full size
Read the whole patent
Listed from its EPO record in Patent Yard's archive of European patents past their term. Its claims, description and drawings are in the EPO PDF and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed November 29, 1986 and never granted as a European patent. Had it been granted, its 20-year term would have ended November 29, 2006.
- A supplementary protection certificate, which can extend a medicine or crop-protection patent, adds at most five and a half years, so even that would have ended by May 29, 2012.
- We check European rights only. A US or other national patent in its family could still be in force: check its family on Espacenet or Google Patents.
FiledNovember 29, 1986
PublishedJune 24, 1987
GrantedNever granted
Term endedNovember 29, 2006
Application numberEP 86116617
Classification (CPC)H10D30/0612 +2 more
Timeline
Timeline From EPO dates
Sources & verification
Official EPO records
Everything on this page comes from the EPO record linked above. EPO data used under CC BY 4.0.