Patent Yard Sign in
European application, no grantEurope

Process for ion implantation in a semiconductor substrate

EP 0123926 A2 · Applicant: ITT INDUSTRIES INC.

EPO PDF

Overview

The published document from the EPO: abstract, claims, description and drawings. Open it full size

Read the whole patent

Listed from its EPO record in Patent Yard's archive of European patents past their term. Its claims, description and drawings are in the EPO PDF and on Google Patents, and the Claude kit works from them.

Google PatentsEPO PDF

Why it's free to use

  • Filed March 30, 1984 and never granted as a European patent. Had it been granted, its 20-year term would have ended March 30, 2004.
  • A supplementary protection certificate, which can extend a medicine or crop-protection patent, adds at most five and a half years, so even that would have ended by September 30, 2009.
  • We check European rights only. A US or other national patent in its family could still be in force: check its family on Espacenet or Google Patents.
FiledMarch 30, 1984
PublishedNovember 7, 1984
GrantedNever granted
Term endedMarch 30, 2004
Application numberEP 84103546
Classification (CPC)H10P30/212 +2 more

Timeline

Timeline From EPO dates

1985198719891991199319951997199920012003Application filedMarch 30, 1984PublishedNov 7, 1984Term endedMarch 30, 2004

Sources & verification

Official EPO records

Full published documentClaims, description and drawings as a PDF.EPOEuropean Patent RegisterProcedure, status, file inspection and legal events.EPOLinked open EP data recordThe bibliographic record this page is built from.EPO

Cross-check elsewhere

Google PatentsFull text, worldwide family, citing patents and legal events.patents.google.comEspacenetNational family members and their legal status.European Patent Office

Everything on this page comes from the EPO record linked above. EPO data used under CC BY 4.0.