Method of forming a wide deep dielectric filled isolation trench in the surface of a silicon semiconductor substrate

Read the whole patent

Listed from its EPO record in Patent Yard's archive of European patents past their term. Its claims, description and drawings are in the EPO PDF and on Google Patents, and the Claude kit works from them.

Why it's free to use

• Filed December 7, 1982 and granted September 27, 1989. A European patent lasts at most 20 years from filing, so its term ended December 7, 2002.
• A supplementary protection certificate, which can extend a medicine or crop-protection patent, adds at most five and a half years, so even that would have ended by June 7, 2008.
• We check European rights only. A US or other national patent in its family could still be in force: check its family on Espacenet or Google Patents.