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Expired European patentEurope

Process of manufacturing polysilicon structures having 1 micron dimensions on silicon substrates comprising integrated circuits using plasma etching

EP 0057258 B1 · Applicant: SIEMENS AKTIENGESELLSCHAFT

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Overview

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Listed from its EPO record in Patent Yard's archive of European patents past their term. Its claims, description and drawings are in the EPO PDF and on Google Patents, and the Claude kit works from them.

Why it's free to use

  • Filed October 16, 1981 and granted September 26, 1984. A European patent lasts at most 20 years from filing, so its term ended October 16, 2001.
  • A supplementary protection certificate, which can extend a medicine or crop-protection patent, adds at most five and a half years, so even that would have ended by April 16, 2007.
  • We check European rights only. A US or other national patent in its family could still be in force: check its family on Espacenet or Google Patents.
FiledOctober 16, 1981
PublishedAugust 11, 1982
GrantedSeptember 26, 1984
Term endedOctober 16, 2001
Application numberEP 81108437
Classification (CPC)C04B41/5346 +1 more

Timeline

Timeline From EPO dates

1982198419861988199019921994199619982000Application filedOct 16, 1981PublishedAug 11, 1982Patent grantedSep 26, 1984Term endedOct 16, 2001

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