Process for producing semiconductor device
CA 2605696 A1 · Owner: Matsuzawa, Jun · Inventors: Yoshida, Masato; Terazaki, Hiroki; Ootuki, Yuuto
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
An abrasive for semiconductor substrate comprises a slurry which comprises a medium and cerium oxide particles dispersed in said medium. The cerium oxide particles include polycrystalline cerium oxide particles constituted of crystallites, having crystal grain boundaries and being capable of forming a new surface. The particles have crystal grain boundaries with a diameter of a middle value of from 100 nm to 1500 nm. The crystallites have a diameter with a middle value of from 5 nm to 250 nm.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed December 18, 1998. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended December 18, 2018.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by December 18, 2020.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.