Microelectronic cleaning composition containing halogen oxygen acids, salts and derivatives thereof

Abstract From the Canadian patent

Microelectronic cleaning compositions for cleaning microelectronic substrates and particularly cleaning compositions useful with and having improved compatibility with microelectronic substrates characterized by silicon dioxide, sensitive low-.kappa. or high-.kappa. dielectrics and copper tungsten, tantalum, nickel, gold, cobalt palladium, platinum, chromium, ruthenium rhodium, iridium, hafnium, titanium, molybdenum tin and other , metallization, as well as substrates of Al or Al(Cu) metallizations and advanced interconnect technologies, are provided by microelectronic cleaning compositions comprising halogen acids, salts and derivatives thereof.