Paper machine fabric
CA 2525200 C · Owner: Rautio, Tania · Inventors: Taipale, Seppo; Turpeinen, Terttu; Rautio, Tania
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The described embodiments address a known problem in paper machine fabrics where the formed structure becomes thick and the dry content of the paper is lowered due to bottom wefts. The paper machine fabric of the described embodiments address this problem to produce a structure with low caliper which, contributes to obtaining good dry content in the forming section. As a result the, paper machine fabric can be made thin because the structure does not utilize conventional bottom wraps, but the machine side is formed of a warp system and a binding yard system. In particular, a paper machine fabric is described that includes at least two machine direction yarn systems (top warps and bottom …
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed June 29, 2004 and granted August 28, 2012. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended June 29, 2024.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by June 29, 2026.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.