High velocity method for deposing diamond films from a gaseous phase in shf discharge plasma and a plasma reactor for carrying out said method
CA 2501070 C · Owner: Bykov, Juriy Vladimirovich · Inventors: Litvak, Aleksandr Grigorievich; Koldanov, Vladimir Aleksandrovich; Denisov, Grigory Gennadievich
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The invention relates to carbon deposition by decomposing gaseous compounds with the aid of the SHF discharge plasma and can be used for example for , producing polycrystalline diamond films (plates) which are used for producing , output windows of power SHF sources for example gyrotrons. Said invention ensures a high speed deposition of the high quality diamond films (having a loss-tangent angle .delta. equal to or less than 3x10 -5) on supports whose diameter is equal to or higher than 100 mm. For this purpose a SHF discharge , is initiated in a gas mixture which is arranged in a reaction chamber and contains at least hydrogen and hydrocarbon. Afterwards said gas mixture is , …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
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- Filed September 18, 2003 and granted June 26, 2012. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended September 18, 2023.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by September 18, 2025.
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