Pattern for improved visual inspection of semiconductor devices
CA 2464108 A1 · Owner: Cree, Inc. · Inventors: Slater, David B. Jr.; Plunket, Christopher Sean; Schneider, Thomas P.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A semiconductor structure is disclosed that enhances quality control inspection of device. The structure includes a substrate having at least one planar face, a first metal layer on the planar face and covering some, but , not all of the planar face in a first predetermined geometric pattern and a , second metal layer on the planar face and covering some, but not all of the planar face in a second geometric pattern that is different from the first geometric pattern. A quality control method for manufacturing a semiconductor device is also disclosed. The method includes the steps of placing a first metal layer on a semiconductor face of a device in a first predetermined geometric, …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed October 10, 2002. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended October 10, 2022.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by October 10, 2024.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.