High pressure processing chamber for multiple semiconductor substrates
CA 2462429 A1 · Owner: Layman, Frederick P. · Inventors: Layman, Frederick P.; Biberger, Maximilian A.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A high pressure processing chamber for processing multiple semiconductor substrates I comprises a chamber housing a cassette, and a chamber closure. , The cassette is removably coupled to the chamber housing. The cassette is configured to accommodate at least two semiconductor substrates. The chamber closure is coupled to the chamber housing. The chamber closure is configured such that in operation the chamber closure seals with the chamber housing to provide an enclosure for high pressure processing of the semicon ductor substrates.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed October 3, 2002. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended October 3, 2022.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by October 3, 2024.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.