Photosensitive resin composition
CA 2453237 A1 · Owner: Kura, Hisatoshi · Inventors: Oka, Hidetaka; Ohwa, Masaki; Kura, Hisatoshi
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A photosensitive composition comprising (A) an oligomer or polymer containing at least one carboxylic acid group in the molecule and having a molecular weight of 200'ooo or less; (B) at least one photoinitiator compound of formula (I), R1, is lenear or banched C1-C12alkyl; R2 is linear or branched C1- C4alkyl; R3 and R4 independently of one another are linear or branched C1- C8alkyl; and (C) a monomeric, oligoneric or polymeric compound having at least one olefinic double bond, is especially suitable for preparting photoresists in particular color filters.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed July 18, 2002. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended July 18, 2022.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by July 18, 2024.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.