Topologically tailored sputtering targets
CA 2433033 A1 · Owner: Honeywell International Inc. · Inventors: Lee, Eal
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
In a standard target configuration, sputtered atoms distribute in a wide angle producing a non-uniform film and poor step coverage mainly because the flux , of sputtered atoms are not collimated and the center region of the wafer (220) experiences a higher flux of sputtered atoms than the edge of the wafer. Sputtering targets (210) described herein are topologically and morphologically tailored such that sputtered atoms impinge directly toward a wafer in a narrow cosine distribution. In effect the target is designed with , a built-in collimator. The desired morphology and topography can be accomplished by micro (e.g. parabolic dimples) (250) and/or macro scale (e.g. wafer contour, …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed February 20, 2002. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended February 20, 2022.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by February 20, 2024.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.