Method of fabricating sub-micron structures in transparent dielectric materials
CA 2428187 C · Owner: Hnatovsky, Cyril · Inventors: Hnatovsky, Cyril; Corkum, Paul; Rayner, David
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A sub-micron structure is fabricated in a transparent dielectric material by focusing femtosecond laser pulses into the dielectric to create a highly tapered modified zone with modified etch properties. The dielectric material is then selectively etched into the modified zone from the direction of the narrow end of the tapered zone so that as the selective etching proceeds longitudinally into the modified zone the progressively increasing width of the modified zone compensates for lateral etching occurring closer to the narrow end so as to produce steep- walled holes. The unetched portion of the modified zone produced by translating the laser beam close to and parallel to the bottom surface …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed May 7, 2003 and granted October 2, 2012. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended May 7, 2023.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by May 7, 2025.
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Timeline
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Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.