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Canadian application, no grantCanada

Compound film, and method for fabricating the same

CA 2419099 A1 · Owner: Matsushita, Masaki · Inventors: Morita, Shinzo; Matsushita, Masaki

CIPO record

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Its claims, description and drawings are in the Canadian Patents Database.

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Abstract From the Canadian patent

A carbon hydrogen raw material gas and a SF6 raw material gas are introduced into a chamber, and a high frequency electric power is introduced into, the chamber to discharge the raw material gas to be made plasma. At the same time, a metallic plate on a main surface of one of parallel plate electrodes is, sputtered to form a compound film made of carbon sulfide and metallic , elements, which are dispersed in the film matrix made of carbon and sulfide and does not constitute clusters through aggregation.

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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.

Why it's free to use

  • Filed February 18, 2003. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended February 18, 2023.
  • A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by February 18, 2025.
  • We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
FiledFebruary 18, 2003
GrantedNo grant recorded
Term endedFebruary 18, 2023
Patent numberCA 2419099 A1
Classification (IPC)C23C14/00 +2 more

Timeline

Timeline From CIPO dates

2004200620082010201220142016201820202022Application filedFeb 18, 2003Term endedFeb 18, 2023

Sources & verification

Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.