Gas supply device for precursors with a low vapor pressure
CA 2399477 A1 · Owner: Klippe, Lutz · Inventors: Bauch, Hartmut; Kupper, Thomas; Bewig, Lars
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The invention relates to a gas supply device for delivering precursors with a low vapor pressure to CVD coating systems. Said gas supply device has a supply container for the precursor which is at a first temperature T1 an , intermediate storage device for intermediately storing the vaporous precursor at a second temperature T2 and at a constant pressure p2 a first gas line , between the supply container and the intermediate storage device and a second gas line for removing gas from the intermediate storage device. According to the invention, the gas supply device is developed in such a way that the first temperature T1 is higher than the second temperature T2. The lower temperature …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed January 27, 2001. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended January 27, 2021.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by January 27, 2023.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.