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A method for the heat treatment of a znse crystal substrate, heat treated substrate and light emission device

CA 2348124 A1 · Owner: Fujiwara, Shinsuke · Inventors: Fujiwara, Shinsuke; Namikawa, Yasuo

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Abstract From the Canadian patent

This invention relates to a method for the heat treatment of a ZnSe crystal substrate to dope it with Al as a donor impurity a ZnSe crystal, substrate prepared by this heat treatment and a light-emitting device using the ZnSe crystal substrate, in particular the method for the heat treatment , of a ZnSe crystal substrate comprising previously forming an Al film on the substrate, first subjecting the substrate to a heat treatment in a Se atmosphere and then subjecting to a heat treatment in a Zn atmosphere.

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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.

Why it's free to use

  • Filed May 16, 2001. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended May 16, 2021.
  • A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by May 16, 2023.
  • We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
FiledMay 16, 2001
GrantedNo grant recorded
Term endedMay 16, 2021
Patent numberCA 2348124 A1
Classification (IPC)C30B29/48 +2 more

Timeline

Timeline From CIPO dates

2002200420062008201020122014201620182020Application filedMay 16, 2001Term endedMay 16, 2021

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Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.