Lens array photolithography
CA 2306899 A1 · Owner: Volkel, Reinhard · Inventors: Cullmann, Elmar; Wells, Karin M.; Volkel, Reinhard
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
An apparatus and method for photolithographic exposure of a substrate including an illumination source for providing light for producing an image on the substrate, a mask including a pattern for projection onto the substrate a , lens assembly for projecting the light through a plurality of lens channels onto the substrate and an actuator for moving the lens assembly in a plane parallel to the mask and the substrate for suppressing interference effects.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed October 22, 1998. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended October 22, 2018.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by October 22, 2020.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.