Techniques for fabricating and packaging multi-wavelength semiconductor laser array devices (chips) and their applications in system architectures

Abstract From the Canadian patent

Phase masks which can be used to make both linear and curved gratings of single or multiple submicron pitches, with or without any abrupt quarterwavelength shifts (or gradually varying finer phase shifts) simultaneously on the wafer/substrate. The phase masks are made using direct write electron or ion-beam lithography of two times the required submicron pitches of linear and curved gratings on commercially available .pi. phase-shifting material on a quartz substrate and wet or dry etching of the .pi. phase-shifting material. The phase masks can be used in connection with making multi-wavelength laser diode chips. The laser diodes have a ridge structure with metal shoulders on …