Improved chemical drying and cleaning system
CA 2303979 A1 · Owner: Schipper, John F. · Inventors: Elson, Robert J.; Schipper, John F.; Ferrell, Gary W.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A system (11) for drying and/or cleaning a workpiece (17A) such as an , electronic part, semiconductor wafer printed circuit board or the like. As the workpiece is withdrawn from a processing or rinsing liquid (13) a , selected drying and/or cleaning liquid such as hydrofluoroether (HFE), an , ethylated hydrofluoroether or an azeotrope of a hydrofluoroether or ethylated hydrofluoroether, that has a very small surface tension is volatile, and has , a density much greater than the processing liquid density is sprayed on, dribbled on, or otherwise transferred to an exposed surface of the workpiece. The workpiece can be dried in 7-45 seconds or less, in most situations and , can be cleaned …
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed September 22, 1998. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended September 22, 2018.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by September 22, 2020.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.