Method for manufacturing a nonlinear optical thin film
CA 2281265 C · Owner: Nakayama, Hideki · Inventors: Nakayama, Hideki; Nakamura, Naoki; Hasegawa, Hiroshi
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A method for manufacturing a nonlinear optical thin film of a silica glass system with sufficient nonlinear optical characteristics, in which a glass substrate 12 is disposed within a vacuum deposition chamber 10 and an electron beam is applied to a SiO2-GeO2-system glass placed on a hearth liner 14 to form a SiO2-GeO2-system thin film on the surface of the substrate 12. In an application of this method, ions of argon for example, are, emitted from an ion source to produce dipoles in the deposited SiO2-GeO2-system thin film. By applying an electric field to the SiO2-GeO2-system thin film thus formed the dipoles are oriented, to let the thin film exhibit nonlinear optical characteristics.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed August 31, 1999 and granted December 16, 2003. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended August 31, 2019.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by August 31, 2021.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
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Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.