Baking oven for the high-temperature treatment of materials with a low dielectric loss factor

Abstract From the Canadian patent

In a baking oven (10) for the high-temperature treatment of materials with a relatively low dielectric loss factor (tan .delta.) by heating the material by absorption of microwave energy in a resonant chamber (16) a uniform energy , intensity of the microwave field is to be achieved for example by irradiating the microwave energy over a broad band and/or by varying in time the frequency of the irradiated microwave energy. The resonant chamber (16) and the radiation source (13) are tuned to each other such that the relation: (V/.lambda.3) .B 20 is satisfied. V stands for the volume of the resonant chamber (16), .lambda. for the wavelength of the microwave radiation and B its band …