Apparatus and process for controlled atmosphere chemical vapor deposition
CA 2269862 C · Owner: Deshpande, Girish · Inventors: Hwang, Tzyy Jiuan; Luten, Henry A.; Shanmugham, Subramaniam
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
An improved chemical vapor deposition apparatus and procedure is disclosed. The technique provides improved shielding of the reaction and deposition zones involved in providing CVD coatings, whereby coatings can be produced at, atmospheric pressure, of materials which are sensitive to components in the atmosphere on substrates which are sensitive to high temperatures and which are too large or inconvenient, to process in vacuum or similar chambers. The improved technique can be used with various energy sources and is particularly compatible with Combustion Chemical Vapor Deposition (CCVD) techniques.
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed April 26, 1999 and granted September 16, 2003. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended April 26, 2019.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by April 26, 2021.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.