Semiconductor manufacturing moisture generation process
CA 2263510 C · Owner: Minami, Yukio · Inventors: Kawada, Koji; Tanabe, Yoshikazu; Minami, Yukio
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
Process for generating moisture for use in semiconductor manufacturing the, process comprising feeding hydrogen and oxygen into a reactor provided with a platinum-coated catalyst layer on an interior wall thus enhancing the , reactivity between hydrogen and oxygen by catalytic action and instantaneously reacting the reactivity-, enhanced hydrogen and oxygen at a temperature below the ignition point to produce, moisture without undergoing combustion at a high temperature wherein the , amount of, unreacted hydrogen occurring in the generated moisture in starting up or terminating the, moisture generating reaction is minimized and wherein undesired reactions such as, undesired silicon …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed June 12, 1998 and granted June 25, 2002. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended June 12, 2018.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by June 12, 2020.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.