Cathodic sputtering device
CA 2251602 A1 · Owner: Sichmann, Eggo · Inventors: Sichmann, Eggo
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A cathodic sputtering device produces layers on a substrate (27) by means of a sputtering cathode (2) which may be introduced into a vacuum chamber which is , rotationally symmetrical with respect to the middle axis (44) of the sputtering cathode (2) and whose surface (41) is at least partially slanted with respect to the target rear side (40). A target surface (41) which slants with respect to the target rear side (74) or at least part of said surface defines an angle with the target rear side (74). The target surface (41) lies between other target surfaces (76, 78) which also define an angle .SIGMA. µ .alpha. with the slanting target surface (41).
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed April 14, 1997. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended April 14, 2017.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by April 14, 2019.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.