Photoresist composition
CA 2238244 A1 · Owner: Yako, Yuko · Inventors: Takahashi, Kenji; Yako, Yuko; Fukui, Nobuhito
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A chemical amplifying type positive photoresist composition, excellent in various properties such as film retention ratio, applicability, heat resistance sensitivity, resolution, profile and time delay resistance and not easily affected by environment which comprises (A), a resin which is converted to alkali-soluble by the action of an acid, (B) an acid generator and (C) a tertiary amine compound having an ether bond; and a fine photo resist pattern can be formed in high precision using the photoresist composition.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed May 21, 1998. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended May 21, 2018.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by May 21, 2020.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.