Reduction of pattern noise in scanning lithographic system illuminators
CA 2222109 A1 · Owner: Svg Lithography Systems, Inc. · Inventors: Mccullough, Andrew W.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
An illumination system for a scanning lithography system used in the manufacture of semiconductor devices having a multiplex array or multi-image array resulting in pattern noise that is reduced by a spatially frequency modulated multiplex array or frequency modulating the pulse rate of a pulsed laser source. A pulsed laser source is used to illuminate a reticle containing a pattern thereon to be reproduced onto a semiconductor. An illumination system using a multiplex array or multi-image array to obtain macro uniformity of an illumination slot or field introduces micro non-uniformity that results in undesirable pattern noise or fixed pattern noise resulting in undesirable imaging …
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed November 25, 1997. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended November 25, 2017.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by November 25, 2019.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.