Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon
CA 2218273 A1 · Owner: Corporation De L'Ecole Polytechnique · Inventors: Najafi, S. Iraj; Fardad, M. Amir; Andrews, Mark P.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The process for fabricating a ridge waveguide on a substrate uses a photosensitive sol-gel glass material prepared according to a first, embodiment, by mixing methacryloxypropyltrimethoxysilane (H2C=C(CH3)CO2(CH2)3Si(OCH3)3) and methacrylic acid (H2C=C(CH3)COOH) or, according to a second embodiment by mixing, methacryloxypropyltrimethoxysilane (H2C=C(CH3)CO2)CH2)3Si(OCH3)3) with bis(s-butoxy)aluminoxytriethoxysilane. A thick film of photosensitive sol-gel glass material is first dip coated on at least a portion of the substrate. A photomask is applied to the film of photosensitive sol-gel glass material, and this sol-gel material is exposed to ultraviolet radiation through the opening(s) of …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed October 10, 1997. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended October 10, 2017.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by October 10, 2019.
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Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.