Cathode mounting for ion source with indirectly heated cathode
CA 2216818 C · Owner: Eaton Corporation · Inventors: Cloutier, Richard M.; Horsky, Thomas N.; Reynolds, William E.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
An ion source embodying the present invention is for use in an ion implanter. The ion source comprises a gas confinement chamber having conductive chamber walls that bound a gas ionization zone. The gas confinement chamber includes an exit opening to allow ions to exit the chamber. A base positions the gas confinement chamber relative to structure for forming an ion beam from ions exiting the gas confinement chamber.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed October 16, 1997 and granted October 8, 2002. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended October 16, 2017.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by October 16, 2019.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.