Non-corrosive cleaning composition for removing plasma etching residues
CA 2214639 A1 · Owner: Olin Microelectronic Chemicals, Inc. · Inventors: Honda, Kenji; Maw, Taishih
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A non-corrosive cleaning composition for removing plasma etching residues comprising water at least one quaternary ammonium hydroxide and at, least one corrosion inhibitor selected from (i) quaternary ammonium silicates and (ii) catechol nucleus-containing oligomers having a molecular weight in the range of about 220 to about 5,000.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed September 4, 1997. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended September 4, 2017.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by September 4, 2019.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.