Plasma cvd method and apparatus
CA 2205221 C · Owner: Nissin Electric Co. Ltd. · Inventors: Nakahigashi, Takahiro; Kawahara, Hajime; Izumi, Yoshihiro
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The present invention provides a plasma CVD method for forming a plasma from a deposition material gas by application of an electric power, and thereby forming a film on a deposition target object in the plasma wherein the, formation of the plasma from the material gas is performed by applying an RF power and a DC power, and the DC power is applied to an electrode carrying the deposition target object. The present invention also provides a plasma CVD apparatus for forming a plasma from a deposition material gas by applying an electric power from the power applying means and thereby forming a film on a deposition target object by exposing the deposition target object to the plasma wherein, …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed September 11, 1996 and granted August 19, 2003. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended September 11, 2016.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by September 11, 2018.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.