Sputtering target erosion profile control for collimated deposition
CA 2186505 A1 · Owner: Hurwitt, Steven · Inventors: Wagner, Israel; Hurwitt, Steven
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A sputtering cathode assembly provides particularly uniform coatings. The assembly includes a sputtering target (10) and a collimator (20) positioned to lie between the target and a wafer (15) to be coated. A magnet assembly preferably rotating, shapes the plasma to produce an erosion profile (12) that forms an erosion groove (18) around the periphery of the target (10) and a shallower erosion area interior of the groove (18) and at least about half as deep and preferably between 0.6 and 0.75 as deep as the groove. The assembly enhances uniformity where collimator aspect ratios exceed approximately 0.5 and particularly where aspect ratios are from 1.0 to over to 2.0, and may vary over the …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed November 28, 1994. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended November 28, 2014.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by November 28, 2016.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
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Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.