Apparatus and method for treatment of substrate surface using plasma focused below orifice leading from chamber into substrate containing area
CA 2182247 C · Owner: Board Of Trustees, A Constitutional Corporation Operating Michigan State University · Inventors: Zhang, Jie; Asmussen, Jes
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A radiofrequency wave apparatus and method which provides a relatively high concentration of reactive species from a plasma for the treatment of a surface particularly of a substrate (31) with a complex geometry in a holder (62) which masks a portion of the substrate. The radiofrequency waves are preferably microwaves or UHF waves. The apparatus and method is particularly useful for rapid plasma assisted chemical vapor deposition of diamond on a portion of the substrate, particularly on surfaces of objects with complex geometries such as a drill (60) or a seal ring (64).
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed July 29, 1996 and granted September 26, 2000. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended July 29, 2016.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by July 29, 2018.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
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Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.