Gas diffuser plate assembly and rf electrode
CA 2177605 A1 · Owner: Tokyo Electron Limited · Inventors: Vanell, James; Garcia, Al
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
The apparatus includes a gas diffuser plate(14) having an integral heat pipe (20) for accurately controlling the temperature of the diffuser plate (14) during CVD processing to prevent unwanted tungsten (or other material) deposition on the diffuser plate. The apparatus is also useful as an RF plasma cleaning in which the diffuser plate (14) acts as an RF electrode, the heat pipe tube (22) acts as an RF input lead and, the apparatus further includes a connector (89) to an RF power source. Additionnaly in combination the heat pipe cooled gas diffuser plate (14) and RF electrode may be used advantageously in plasma enhanced chemical vapor deposition (PECVD).
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed November 22, 1994. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended November 22, 2014.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by November 22, 2016.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.