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Canadian application, no grantCanada

Ablative imaging by proximity lithography

CA 2175678 A1 · Owner: Minnesota Mining And Manufacturing Company · Inventors: Dunn, Douglas S.; Stubbs, Daniel P.; Ouderkirk, Andrew J.

CIPO record

Overview

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Its claims, description and drawings are in the Canadian Patents Database.

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Abstract From the Canadian patent

The present invention includes a method of creating a shaped image (13) in a workpiece (10) using a high energy source (12) with the method comprising positioning a layer (16) proximate the workpiece such that the layer prevents debris from the workpiece from dispersing, and directing radiation from the high energy source through the layer to the workpiece the layer substantially transparent to radiation emitted by the high energy source such that the high energy source is capable of forming the shaped image.

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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.

Why it's free to use

  • Filed October 31, 1994. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended October 31, 2014.
  • A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by October 31, 2016.
  • We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
FiledOctober 31, 1994
GrantedNo grant recorded
Term endedOctober 31, 2014
Patent numberCA 2175678 A1
Classification (IPC)B41M5/24 +2 more

Timeline

Timeline From CIPO dates

1995199719992001200320052007200920112013Application filedOct 31, 1994Term endedOct 31, 2014

Sources & verification

Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.