Semiconductor wafer processing method and apparatus with heat and gas flow control
CA 2136863 A1 · Owner: Rebenne, Helen Elise · Inventors: Rebenne, Helen Elise; Leblanc, Rene E.; White, Carl L.
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
2136863 9326038 PCTABScor01, A semiconductor wafer processing apparatus (10) is provided with a susceptor (40) for supporting a wafer (44) for CVD of films such as blanket or selective deposition of tungsten or titanium nitride, and degassing and annealing processes. Preferably a, downwardly facing showerhead (35) directs a gas mixture from a cooled mixing chamber (30) onto an upwardly facing wafer (44) on the susceptor (40). Smooth interior reactor surfaces include baffles (90 101, 102) and a susceptor lip (162) and wall (130) shaped to minimize turbulence. Inert gases flow to minimize turbulence by filling gaps in susceptor structure, prevent contamination of moving parts, conduct heat …
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Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed June 11, 1993. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended June 11, 2013.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by June 11, 2015.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
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Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.