A process for forming a photosensitive material and an exposure apparatus used for the process

Abstract From the Canadian patent

Mask patterns and thire exposure times are stored in a memory within a controller. The controller transfers the mask pattern to a memory in the liquid crystal controller. The mask pattern stored in the memory is displayed on the matrix liquid crystal display element. The controller transfers the next mask pattern to memory after the elapse of exposure time. By this exposure apparatus a plurality of mask patterns is exposed on a photosensitive material. The exposure time of each portion of the photosensitive material is adjusted in three or more grades by exposing a plurality of mask patterns sequentially. If the photosensitive material is positive the film thickness becomes low in a portion …