Photosensitive polycondensation compound for negative lithographic plates
CA 2120404 A1 · Owner: Lastra S.P.A. · Inventors: Canestri, Giuseppe; De Candido, Stefano
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
1 -, "Photosensitive polycondensation compound for negative lithographic plates.", ABSTRACT, Process for preparing a photosensitive polycondensation compound in the presence of condensing medium which is a mixture containing from 30 to 5 parts by weight of 98% aqueous methanesulfonic acid and from 70 to 95 parts by weight of 85% aqueous phosphoric acid, respectively. Thus obtained polycondensation compound and printing plates containing it.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed March 31, 1994. No grant is recorded for it in Canada; had it been granted, its 20-year term would have ended March 31, 2014.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by March 31, 2016.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.