Method of forming a micro structure and an x-ray mask
CA 2118753 C · Owner: Sumitomo Electric Industries, Ltd. · Inventors: Ogino, Seiji; Numazawa, Toshiyuki
Overview
Its claims, description and drawings are in the Canadian Patents Database.
Open the CIPO recordAbstract From the Canadian patent
A method of forming a microstructure having higher aspect ratio by using a general purpose synchrotron orbital radiation apparatus is provided. A resist layer mainly including a copolymer of methylmethacrylate and methacrylic acid is formed on a substrate. Lithography by synchrotron orbital radiation is carried out on the resist layer to form a resist pattern. By carrying out normal electroplating electroforming or the like in accordance with the resist pattern a microstructure having high aspect ratio is obtained.
Read the whole patent
Listed from its CIPO record in Patent Yard's archive of Canadian patents past their term. Its claims, description and drawings are in the CIPO record and on Google Patents, and the Claude kit works from them.
Why it's free to use
- Filed March 10, 1994 and granted October 3, 2000. A Canadian patent filed from October 1, 1989 lasts 20 years from filing, so its term ended March 10, 2014.
- A certificate of supplementary protection adds at most two years for a drug, so even that would have ended by March 10, 2016.
- We check Canadian rights only. A patent in its family in another country could still be in force: check its family on Google Patents.
Timeline
Timeline From CIPO dates
Sources & verification
Official CIPO records
Everything on this page comes from the CIPO record linked above. Contains information licensed under the Open Government Licence – Canada.